The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Mar. 10, 2009
Tomoyuki Okada, Kawasaki, JP;
Tomoyuki Okada, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
A computer-implemented method, of processing design data to obtain photomask data, includes: selecting, amongst design data, data representing a first cell; selecting a first area in said first cell for which a configuration of a corresponding first pattern is influenced by patterns arranged outward relative to said first cell area; selecting a second area other than said first area in said first cell; constructing a hierarchical structure for said data representing said first cell area that includes said first area and said second area; subjecting the first area to optical proximity correction on the basis of a relationship between the first pattern and the patterns arranged around said first cell area; performing optical proximity correction in said second area on the basis of the first pattern; and synthesizing the corrected first area and the corrected second area, according to the hierarchical structure, to obtain photomask data.