The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Nov. 02, 2011
Jose Pezzutti, Mendoza, AR;
Alberto Benito, Mendoza, AR;
Guillermo Cassano, Mendoza, AR;
Leandro Roth, Mendoza, AR;
Werner Schoene, Schriesheim, DE;
Hartmut Siebert, Alkoven Strassham, AT;
Andreas Winter, Neuleininger, DE;
Anita Dimeska, Bad Durkheim, DE;
Vassilios Galiatsatos, Lebanon, OH (US);
Jose Pezzutti, Mendoza, AR;
Alberto Benito, Mendoza, AR;
Guillermo Cassano, Mendoza, AR;
Leandro Roth, Mendoza, AR;
Werner Schoene, Schriesheim, DE;
Hartmut Siebert, Alkoven Strassham, AT;
Andreas Winter, Neuleininger, DE;
Anita Dimeska, Bad Durkheim, DE;
Vassilios Galiatsatos, Lebanon, OH (US);
Lummus Novolen Technology GmbH, Mannheim, DE;
Abstract
A high impact strength random block copolymer including (a) about 65-97 wt. % of a crystalline propylene/ethylene copolymer A containing from about 0.5 wt. % to about 6 wt. % derived from ethylene and from about 94 wt. % to about 99.5 wt. % derived from propylene, and (b) about 3-35 wt. % of a propylene/ethylene copolymer B containing from about 8 wt. % to about 40 wt % derived from ethylene and from about 60 wt % to about 92 wt. % derived from propylene. The crystalline to amorphous ratio Lc/La of the random block copolymer ranges from about 1.00 to about 2.25. The random block copolymer is characterized by both high toughness and low haze.