The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Mar. 26, 2009
Applicants:
Myoung-soo Lee, Suwon-si, KR;
Young-su Sung, Gangwon-do, KR;
Hee-bom Kim, Seongnam-si, KR;
Min-kyung Lee, Anyang-si, KR;
Dong-gun Lee, Hwaseong-si, KR;
Inventors:
Myoung-soo Lee, Suwon-si, KR;
Young-su Sung, Gangwon-do, KR;
Hee-bom Kim, Seongnam-si, KR;
Min-kyung Lee, Anyang-si, KR;
Dong-gun Lee, Hwaseong-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.