The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Sep. 10, 2008
Wolfgang Viol, Adelebsen, DE;
Stefan Born, Gottingen, DE;
Andy Kaemling, Birkenfelde, DE;
Fachhochschule Hildesheim/Holzminden/Goettingen, Hildesheim, DE;
Abstract
A device () for plasma treatment comprises an electrode () having a surface () covered by a dielectric barrier (), and an AC high voltage source () for applying an AC high voltage to the electrode () to bring about a dielectric barrier discharge () in a gas () at atmospheric pressure present in front of the dielectric barrier () in order to generate a plasma. To the end of generating the plasma even without a counter-electrode for the electrode (), pointed tips are distributed over the surface () of the electrode (), these pointed tips pointing towards the gas () in front of the dielectric barrier (), whereas the dielectric barrier () has a smooth outer surface () facing the gas ().