The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Mar. 28, 2006
Christian Buchner, Neckargmuend, DE;
Johann Brunner, Birkenfeld, DE;
Helmut Kalmbach, Freudenstadt, DE;
Josef Gentischer, Weinstadt, DE;
Christian Buchner, Neckargmuend, DE;
Johann Brunner, Birkenfeld, DE;
Helmut Kalmbach, Freudenstadt, DE;
Josef Gentischer, Weinstadt, DE;
Schmid Technology Systems GmbH, Niedereschach, DE;
Abstract
A device for applying an even, thin fluid layer, in particular a phosphoric acid layer, onto substrates, in particular silicon cells for photovoltaic application, is provided with a process chamber, which is provided with a fluid pan and a high-frequency ultrasound device that converts the fluid into fluid mist, and with a transport device that is arranged beneath a fluid-mist dropping shaft of the process chamber for the substrates. To create a device of this type, which permits an application of the fluid onto the silicon cells in question that is substantially more homogeneous regarding both surface area and volume, the fluid-mist dropping shaft of the process chamber tapers in its interior cross-section towards the transport device and discharges into a passage shaft arrangement for the substrates that covers the transport device, and the interior cross-section of the orifice end of the fluid-mist dropping shaft and of the passage shaft arrangement are coordinated with each other, preferably being essentially identical.