The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2012
Filed:
Jun. 04, 2008
Applicant:
Woo Yung Jung, Seoul, KR;
Inventor:
Woo Yung Jung, Seoul, KR;
Assignee:
Hynix Semiconductor Inc., Icheon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a method of forming a hard mask pattern in a semiconductor device, only processes for forming patterns having a row directional line shape and a column directional line shape on a plane are performed so that the hard mask patterns can be formed to define densely disposed active regions. A pitch of the hard mask patterns is less than a resolution limit of an exposure apparatus.