The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2012

Filed:

Feb. 23, 2010
Applicants:

Huapeng Huang, Ellicott City, MD (US);

Alexei Vershinin, Schenectady, NY (US);

Inventors:

Huapeng Huang, Ellicott City, MD (US);

Alexei Vershinin, Schenectady, NY (US);

Assignee:

X-Ray Optical Systems, Inc., East Greenbrush, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/207 (2006.01);
U.S. Cl.
CPC ...
Abstract

An x-ray diffraction apparatus for measuring crystal orientation of a multiple grain sample. An x-ray excitation path is provided having a focusing optic for collecting x-rays from an x-ray source and redirecting the collected x-rays into an x-ray beam converging on a single grain of the multiple grain sample. At least one point detector and the sample are rotated relative to each other; and a grain orientation is obtained based upon diffraction patterns collected from first and second grain crystal planes within the apparatus.


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