The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Jun. 06, 2007
Applicant:
Hiroya Fukuyama, Machida, JP;
Inventor:
Hiroya Fukuyama, Machida, JP;
Assignee:
Olympus Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/02 (2006.01); G02B 21/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is provided a lighting system having a high spatial resolution appropriate to a high-frequency component by evanescent waves in a negative refraction lens. The lighting system includes a light emitter thin film () which includes a light emitting material which emits light when an energy is applied, a cathode () for applying an electron beam () which is the energy, to the light emitter thin film (), and a negative refraction lens () which is formed of a material exhibiting negative refraction, and has an optical system for projecting light emitted from the light emitter thin film (), on an object.