The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Mar. 23, 2009
Kapila Wijekoon, Palo Alto, CA (US);
Rohit Mishra, Santa Clara, CA (US);
Michael P Stewart, Mountain View, CA (US);
Timothy Weidman, Sunnyvale, CA (US);
Hari Ponnekanti, San Jose, CA (US);
Tristan R. Holtam, Saratoga, CA (US);
Kapila Wijekoon, Palo Alto, CA (US);
Rohit Mishra, Santa Clara, CA (US);
Michael P Stewart, Mountain View, CA (US);
Timothy Weidman, Sunnyvale, CA (US);
Hari Ponnekanti, San Jose, CA (US);
Tristan R. Holtam, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for surface texturing a crystalline silicon substrate are provided. In one embodiment, the method includes providing a crystalline silicon substrate, wetting the substrate with an alkaline solution comprising a wetting agent, and forming a textured surface with a structure having a depth about 1 μm to about 10 μm on the substrate. In another embodiment, a method of performing a substrate texture process includes providing crystalline silicon substrate, pre-cleaning the substrate in a HF aqueous solution, wetting the substrate with a KOH aqueous solution comprising polyethylene glycol (PEG) compound, and forming a textured surface with a structure having a depth about 3 μm to about 8 μm on the substrate.