The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Nov. 20, 2007
Lyn M. Irving, Rochester, NY (US);
Diane C. Freeman, Pittsford, NY (US);
Peter J. Cowdery-corvan, Webster, NY (US);
Cheng Yang, Pittsford, NY (US);
David H. Levy, Rochester, NY (US);
Lyn M. Irving, Rochester, NY (US);
Diane C. Freeman, Pittsford, NY (US);
Peter J. Cowdery-Corvan, Webster, NY (US);
Cheng Yang, Pittsford, NY (US);
David H. Levy, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer by exposing the first layer through the color mask with visible light to form a first pattern and developing the deposition inhibitor material to provide selected areas of the first layer effectively not having the deposition inhibitor material; and (e) depositing a second layer of functional material over the transparent support; wherein the second layer of functional material is substantially deposited only in selected areas over the transparent support not having the deposition inhibitor material.