The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Feb. 23, 2011
William Gurney Dorfeld, Salida, CO (US);
Adam James Gillmar Ellison, Painted Post, NY (US);
Qiao LI, Horseheads, NY (US);
Susan Lee Schiefelbein, Ithaca, NY (US);
William Gurney Dorfeld, Salida, CO (US);
Adam James Gillmar Ellison, Painted Post, NY (US);
Qiao Li, Horseheads, NY (US);
Susan Lee Schiefelbein, Ithaca, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
A method of controlling blister formation in a glass melt flowing through a system comprising one or more refractory metal vessels by developing a blister index and determining the critical blister index value. The critical value of the blister index may be used to control the principal variables responsible for blister formation, including the water content of the melt, the concentration of reduced multivalent oxide compounds in the melt, and the hydrogen partial pressure of an atmosphere in contact with the outside surface of the refractory metal vessel. Also disclosed is a minimum partial pressure of hydrogen necessary to produce an essentially blister-free glass article in a glass essentially free of arsenic and antimony.