The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Jun. 17, 2009
Jin-soo Jung, Goyang-si, KR;
Nak-cho Choi, Seoul, KR;
Jin-Soo Jung, Goyang-si, KR;
Nak-Cho Choi, Seoul, KR;
Abstract
A method of forming an alignment layer includes; providing a substrate having a base substrate and a photosensitive polymer layer disposed on the base substrate, the base substrate including a plurality of unit pixel areas, each of which is divided into a plurality of sub-pixel areas, photoaligning the photosensitive polymer layer by irradiating first light to a first exposure area of a first unit pixel area, the first light being inclined at a first angle with respect to the substrate in a first direction, and substantially simultaneously photoaligning the photosensitive polymer layer by irradiating second light to a second exposure area of a second unit pixel area at substantially the same time as the first light is irradiated to the first exposure area, the second light being inclined at a second angle with respect to the substrate in a second direction.