The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Oct. 07, 2010
Applicants:
Ulrich Mueller, Neustadt, DE;
Gerald Lippert, Lampertheim, DE;
James Reuben Brown, Mannheim, DE;
Hermann Gies, Sprockhoevel, DE;
Bernd Marler, Gevelsberg, DE;
Nadine Stroeter, Bochum, DE;
Yingxia Wang, Beijing, CN;
Inventors:
Ulrich Mueller, Neustadt, DE;
Gerald Lippert, Lampertheim, DE;
James Reuben Brown, Mannheim, DE;
Hermann Gies, Sprockhoevel, DE;
Bernd Marler, Gevelsberg, DE;
Nadine Stroeter, Bochum, DE;
Yingxia Wang, Beijing, CN;
Assignees:
BASF Aktiengesellschaft, Ludwigshafen, DE;
rubitec GmbH, Bochum, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 53/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur: 100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.