The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Jul. 24, 2008
Yoshikazu Hama, Okaya, JP;
Hirotsuna Miura, Fujimi, JP;
Yoshikazu Hama, Okaya, JP;
Hirotsuna Miura, Fujimi, JP;
Seiko Epson Corporation, , JP;
Abstract
A pattern formation method includes discharging a functional liquid substance having a functional material to an object, and irradiating the functional liquid substance with light emitted from a light source thereby to form a pattern of a functional film on the object. In this method, when the thickness of the functional liquid substance on an optical axis of the light is L and the absorption coefficient of the functional liquid substance for the light is α, the thickness and the absorption coefficient are set so as to satisfy an equation (1):0.1≦α·≦0.7   (1).