The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Oct. 20, 2005
Atsuro Inada, Kawasaki, JP;
Kazuhiko Ueno, Kawasaki, JP;
Atsuro Inada, Kawasaki, JP;
Kazuhiko Ueno, Kawasaki, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Abstract
The wafer processing apparatusincluded in an etching apparatus selectively etches the peripheral portion of a wafer. The wafer processing apparatusincludes a lower electrodeas a stage on which the waferis placed, a process gas introducing ductsupplying therethgouh a process gas etching the peripheral portion, an etching-interfering gas introducing ductsupplying therethrough an etching-interfering gas interfering supply of the process gas to the center portion of the wafer, and a movable alignment mechanismaligning the wafer on the lower electrode. The etching-interfering gas introducing ductand the process gas introducing ductcan be provided in an upper electrode