The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Jun. 03, 2010
Katsutoshi Takagi, Kobe, JP;
Junichi Nakai, Kobe, JP;
Yuuki Tauchi, Kobe, JP;
Hitoshi Matsuzaki, Takasago, JP;
Hideo Fujii, Takasago, JP;
Katsutoshi Takagi, Kobe, JP;
Junichi Nakai, Kobe, JP;
Yuuki Tauchi, Kobe, JP;
Hitoshi Matsuzaki, Takasago, JP;
Hideo Fujii, Takasago, JP;
Kabushiki Kaisha Kobe Seiko Sho, Kobe-shi, JP;
Kobelco Research Institute, Inc., Kobe-shi, JP;
Abstract
An Ag sputtering targethas three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering targetin planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values Aand Busing the formula below, and selecting larger one of the values Aand Bas the three-dimensional fluctuation of the grain sizes.1=()/×100(%)1=()/×100(%)