The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Jun. 11, 2009
Geng Han, Yorktown Heights, NY (US);
Fook-luen Heng, Yorktown Heights, NY (US);
Jin Fuw Lee, Yorktown Heights, NY (US);
Chao Yi Tien, Legal Representative, Yorktown Heights, NY (US);
Rama N. Singh, Yorktown, NY (US);
Geng Han, Yorktown Heights, NY (US);
Fook-Luen Heng, Yorktown Heights, NY (US);
Jin Fuw Lee, Yorktown Heights, NY (US);
Chao Yi Tien, legal representative, Yorktown Heights, NY (US);
Rama N. Singh, Yorktown, NY (US);
International Business Macines Corporation, Armonk, NY (US);
Abstract
A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.