The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2012

Filed:

Feb. 05, 2008
Applicant:

James F. Detry, Plymouth, MN (US);

Inventor:

James F. Detry, Plymouth, MN (US);

Assignee:

Honeywell International Inc., Morristown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical bench communicates light through free space in a plurality of trenches formed in the bench, each of the trenches formed by deep ion reactive etching and defined by two opposing side walls, such that the free space is between the opposing side walls. An exemplary embodiment has a first trench operable to receive the beam of light and operable to communicate the beam of light through the free space in the first trench; an angled reflection side wall operable to receive the beam of light routed through the first trench and operable to reflect at least a portion of the beam of light; and a second trench operable to receive the portion of the beam of light reflected from the angled reflection side wall and operable to route the portion of the beam of light through the free space in the second trench.


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