The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8120849 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 21, 2012

Filed:

Jan. 27, 2009
Applicant:

Shinichi Nakai, Fujinomiya, JP;

Inventor:

Shinichi Nakai, Fujinomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A retardation film is manufactured by stretching a thermoplastic resin film while adjusting stretching ratio α [%], temperature β [° C.], and stretching speed γ [%/min] so that the following formulas (1) and (2) are satisfied when the thermoplastic resin film is stretched at the stretching ratio α [%], the temperature β [° C.], and the stretching speed γ [%/min], therefore, stretching unevenness can be prevented:Z>X   (1)()×100/  (2)here X represents yield stress [MPa] in a stress-strain curve, Y represents stress [MPa] in the stress-strain curve when the film is further stretched from the yield stress by k [%] which is the amount of strain until the yield stress, and Z represents stress [MPa] in the stress-strain curve when the film is stretched to α [%].


Find Patent Forward Citations

Nakai, Shinichi. (2012). Method for manufacturing retardation film, retardation film, polarizing plate, and liquid crystal display (U.S. Patent No. 8120849). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8120849

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