The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Jan. 27, 2009
Shinichi Nakai, Fujinomiya, JP;
Shinichi Nakai, Fujinomiya, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
A retardation film is manufactured by stretching a thermoplastic resin film while adjusting stretching ratio α [%], temperature β [° C.], and stretching speed γ [%/min] so that the following formulas (1) and (2) are satisfied when the thermoplastic resin film is stretched at the stretching ratio α [%], the temperature β [° C.], and the stretching speed γ [%/min], therefore, stretching unevenness can be prevented:Z>X   (1)()×100/  (2)here X represents yield stress [MPa] in a stress-strain curve, Y represents stress [MPa] in the stress-strain curve when the film is further stretched from the yield stress by k [%] which is the amount of strain until the yield stress, and Z represents stress [MPa] in the stress-strain curve when the film is stretched to α [%].