The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2012

Filed:

Oct. 07, 2009
Applicant:

Jeong-su Park, Gwanak-gu, KR;

Inventor:

Jeong-Su Park, Gwanak-gu, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/062 (2006.01); H01L 31/113 (2006.01); H01L 27/148 (2006.01); H01L 29/768 (2006.01); H01L 31/06 (2006.01); H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An image sensor includes a trench formed in a semiconductor substrate, a first reflection part formed in the trench and having an inclined, curved surface, a second reflection part formed on the first reflection part such that a remaining space of the trench is filled with the second reflection part, and a vertical type photodiode formed on a region of the substrate between trenches. A method for forming the image sensor includes forming a trench in a semiconductor substrate, forming a first reflection part having an inclined, curved surface in the trench, forming a second reflection part on the first reflection part such that a remaining space of the trench is filled with the second reflection part, and forming a vertical type photodiode on a region of the substrate between trenches.


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