The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8119504 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 21, 2012

Filed:

May. 18, 2010
Applicants:

Nyan-hwa Tai, Hsinchu, TW;

Tsung-yen Tsai, Hsinchu, TW;

Inventors:

Nyan-Hwa Tai, Hsinchu, TW;

Tsung-Yen Tsai, Hsinchu, TW;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for transferring a nano material formed on a first substrate through deposition techniques to a second substrate, includes: (A) contacting the second substrate with a free end of the nano material on the first substrate; (B) heating the first substrate so that heat is conducted substantially from the first substrate through the nano material to the second substrate to soften a contact portion of a surface of the second substrate that is in contact with the free end of the nano material; (C) after step (B), cooling the second substrate so as to permit hardening of the contact portion of the surface of the second substrate and solid bonding of the nano material to the second substrate; and (D) after step (C), removing the first substrate from the nano material.


Find Patent Forward Citations

Tai, Nyan-Hwa. (2012). Method for transferring a nano material from a substrate to another substrate (U.S. Patent No. 8119504). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8119504

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