The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8118906 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 21, 2012

Filed:

Oct. 29, 2007
Applicants:

Wuwen Yi, Tempe, AZ (US);

William Heckman, Montague, MI (US);

Bernd Kunkel, Phoenix, AZ (US);

Carl Derrington, Tempe, AZ (US);

Patrick Griffin, Chandler, AZ (US);

Inventors:

Wuwen Yi, Tempe, AZ (US);

William Heckman, Montague, MI (US);

Bernd Kunkel, Phoenix, AZ (US);

Carl Derrington, Tempe, AZ (US);

Patrick Griffin, Chandler, AZ (US);

Assignee:

Heraeus Inc., Chandler, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of recycling ruthenium (Ru) and Ru-based alloys comprises steps of: providing a solid body of Ru or a Ru-based alloy; segmenting the body to form a particulate material; removing contaminants, including Fe, from the particulate material; reducing the sizes of the particulate material to form a powder material; removing contaminants, including Fe, from the powder material; reducing oxygen content of the powder material to below a predetermined level to form a purified powder material; and removing particles greater than a predetermined size from the purified powder material. The purified powder material may be utilized for forming deposition sources, e.g., sputtering targets.


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