The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Jun. 25, 2008
Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices
Akira Hayashida, Toyama, JP;
Masaaki Ueno, Toyama, JP;
Masakazu Shimada, Toyama, JP;
Masashi Sugishita, Toyama, JP;
Toshimitsu Miyata, Toyama, JP;
Kimio Kitamura, Osaka, JP;
Kenji Tanaka, Osaka, JP;
Jyunichi Nishihara, Osaka, JP;
Akira Hayashida, Toyama, JP;
Masaaki Ueno, Toyama, JP;
Masakazu Shimada, Toyama, JP;
Masashi Sugishita, Toyama, JP;
Toshimitsu Miyata, Toyama, JP;
Kimio Kitamura, Osaka, JP;
Kenji Tanaka, Osaka, JP;
Jyunichi Nishihara, Osaka, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Teitokusha Co., Ltd., Osaka, JP;
Abstract
A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.