The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2012

Filed:

Apr. 16, 2004
Applicants:

Osamu Wakabayashi, Hiratsuka, JP;

Tatsuya Ariga, Hiratsuka, JP;

Takahito Kumazaki, Hiratsuka, JP;

Kotaro Sasano, Hiratsuka, JP;

Inventors:

Osamu Wakabayashi, Hiratsuka, JP;

Tatsuya Ariga, Hiratsuka, JP;

Takahito Kumazaki, Hiratsuka, JP;

Kotaro Sasano, Hiratsuka, JP;

Assignee:

Komatsu Ltd., Hiratsuka-Shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser () and an amplification-stage laser (). Oscillation laser light having divergence is used as the oscillation-stage laser (), and the amplification-stage laser () comprises a Fabry-Perot etalon resonator made up of an input side mirror () and an output side mirror (). The resonator is configured as a stable resonator.


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