The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Aug. 25, 2006
Tatsuya Yoshizawa, Tsurugashima, JP;
Kenichi Nagayama, Tsurugashima, JP;
Takuya Hatakeyama, Tsurugashima, JP;
Tatsuya Yoshizawa, Tsurugashima, JP;
Kenichi Nagayama, Tsurugashima, JP;
Takuya Hatakeyama, Tsurugashima, JP;
Pioneer Corporation, Tokyo, JP;
Abstract
A method is provided, of manufacturing a material to be etched that can more preferably prevent a region to be etched from remaining as an un-etched region and reduce deviation of etched/un-etched regions. Patterning (a method of manufacturing a material to be etched) of a substrate, which is manufactured by performing etching through an opened regionby an etching mask M, is performed by a first etching process and a second etching process that is performed after the first etching process. The second etching process is a process for etching a region including a region that is not etched by the first etching process. An un-etched region, which is the same as etched using a virtual etching mask M', is formed on the surface of an object to be etched by the first and second etching processes.