The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Jul. 08, 2010
Mark O. Trulson, San Jose, CA (US);
Glenn H. Mcgall, Palo Alto, CA (US);
Bei-shen Sywe, Cupertino, CA (US);
Lisa T. Kajisa, Palo Alto, CA (US);
Dana Truong, Sacramento, CA (US);
Rich P. Rava, Redwood City, CA (US);
Martin J. Goldberg, Saratoga, CA (US);
Mark O. Trulson, San Jose, CA (US);
Glenn H. McGall, Palo Alto, CA (US);
Bei-Shen Sywe, Cupertino, CA (US);
Lisa T. Kajisa, Palo Alto, CA (US);
Dana Truong, Sacramento, CA (US);
Rich P. Rava, Redwood City, CA (US);
Martin J. Goldberg, Saratoga, CA (US);
Affymetrix, Inc., Santa Clara, CA (US);
Abstract
The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.