The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Feb. 15, 2011
Laurence Warden, Poway, CA (US);
Andreas W. Dreher, Escondido, CA (US);
Gary D. Mills, Escondido, CA (US);
Shui T. Lai, Encinitas, CA (US);
William G. Foote, Poway, CA (US);
David G. Sandler, San Diego, CA (US);
Keith J. Dillon, La Jolla, CA (US);
Laurence Warden, Poway, CA (US);
Andreas W. Dreher, Escondido, CA (US);
Gary D. Mills, Escondido, CA (US);
Shui T. Lai, Encinitas, CA (US);
William G. Foote, Poway, CA (US);
David G. Sandler, San Diego, CA (US);
Keith J. Dillon, La Jolla, CA (US);
Ophthonix, Inc., Vista, CA (US);
Abstract
A binocular wavefront measurement system for performing wavefront analysis on the eyes of a patient, the system comprising an optics system for providing an image to a first eye along a first optical path and an image to a second eye along a second optical path and a sensor system, said sensor system configurable in a first mode for performing a wavefront measurement of a first eye through a portion of the first optical path and configurable in a second mode for performing a wavefront measurement of a second eye through a portion of the second optical path.