The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Dec. 05, 2007
Tae-su Kim, Daejeon, KR;
Jae-jin Kim, Seoul, KR;
Bu-gon Shin, Daejeon, KR;
Duk-sik Ha, Daejeon, KR;
Jung-ho Park, Daejeon, KR;
Tae-Su Kim, Daejeon, KR;
Jae-Jin Kim, Seoul, KR;
Bu-Gon Shin, Daejeon, KR;
Duk-Sik Ha, Daejeon, KR;
Jung-Ho Park, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d<<D, and the hit ink droplets are flowed in an anisotropic form within the region.