The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Jul. 02, 2007
Applicants:
Hideki Kawai, Kobe, JP;
Yukitoshi Nakatsuji, Sakai, JP;
Hiroaki Sawada, Sakai, JP;
Shinichi Saeki, Sakai, JP;
Inventors:
Hideki Kawai, Kobe, JP;
Yukitoshi Nakatsuji, Sakai, JP;
Hiroaki Sawada, Sakai, JP;
Shinichi Saeki, Sakai, JP;
Assignee:
Konica Minolta Opto, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 19/00 (2006.01); C03C 3/06 (2006.01); G11B 5/07 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for cleaning a glass substrate which ensures removal of abrasive and other foreign matter without making a cleaning step complicated involves cleaning the glass substrate by scrubbing using two or more types of cleaning liquid having different Si element elution abilities. The cleaning liquid having the highest Si element elution is used first, and the cleaning liquid having the lowest Si element elution is used last.