The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2012

Filed:

May. 14, 2007
Applicant:

Norihisa Moriya, Toshima-Ku, JP;

Inventor:

Norihisa Moriya, Toshima-Ku, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plate inspection system and a plate inspection method with which irregularities in phase difference caused in a retardation layer can be efficiently detected. The inspection system is for inspecting a plate to be inspected having a retardation layer. The plate inspection system comprises a polarized-light source for irradiating a polarized light and an observation-side polarizer placed on the observation side. In the inspection system, a plate to be inspected is placed between the polarized-light source and the observation-side polarizer so that the plate to be inspected is irradiated with polarized light from the polarized-light source. The position of at least the observation-side polarizer or the plate to be inspected is changeable relative to the polarized-light source.


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