The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Dec. 09, 2008
Bum Ho Choi, Kwangju, KR;
Jong Ho Lee, Kwangju, KR;
Jung Chan Bae, Kyounggi, KR;
Yong-seok Park, Seoul, KR;
Chun-seong Park, Suwon-si, KR;
Woo Sam Kim, Seoul, KR;
Gil Sik Lee, Plano, TX (US);
Lawrence John Overzet, Richardson, TX (US);
Byeong Jun Lee, Daegu, KR;
Bum Ho Choi, Kwangju, KR;
Jong Ho Lee, Kwangju, KR;
Jung Chan Bae, Kyounggi, KR;
Yong-Seok Park, Seoul, KR;
Chun-Seong Park, Suwon-si, KR;
Woo Sam Kim, Seoul, KR;
Gil Sik Lee, Plano, TX (US);
Lawrence John Overzet, Richardson, TX (US);
Byeong Jun Lee, Daegu, KR;
Korea Institute of Industrial Technology, Cheonana-Si, Chungcheongnam-Do, KR;
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
Disclosed is an atmospheric pressure plasma apparatus for enhancing and or controlling the dissociation of a secondary gas by converting a source gas into a plasma state at atmospheric pressure and controlling the interaction between that plasma and the secondary gas using porous metal, and ceramic tubes to create a path having controllable isolation from the region where plasma is generated.