The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Jun. 30, 2009
Jae Seung Choi, Icheon-si, KR;
Jae Seung Choi, Icheon-si, KR;
Hynix Semiconductor, Inc., Icheon, KR;
Abstract
A method is disclosed for manufacturing a semiconductor device. The method includes: forming a substrate including a cell region and an outside region, wherein the outside region is adjacent to the cell region; forming a line-shaped pattern over the substrate using a first exposure mask so that the line-shaped spacer pattern extends from the cell region to the outside region; and patterning the line-shaped pattern in the cell region into a bar pattern while removing the line-shaped pattern in the outside region using a second exposure mask, wherein the line-shaped pattern can be formed using a spacer patterning technology (SPT) or a double pattern technology (DPT).