The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Nov. 19, 2008
Wolfgang Aderhold, Cupertino, CA (US);
Jallepally Ravi, Santa Clara, CA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Aaron M. Hunter, Santa Cruz, CA (US);
Ilias Iliopoulos, Foster City, CA (US);
Wolfgang Aderhold, Cupertino, CA (US);
Jallepally Ravi, Santa Clara, CA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Aaron M. Hunter, Santa Cruz, CA (US);
Ilias Iliopoulos, Foster City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and systems for determining a radial differential metrology profile of a substrate heated in a process chamber is provided. Methods and systems for determining an angular or azimuthal differential metrology profile of a rotating substrate in a processing chamber are also provided. The radial and azimuthal differential metrology profiles are applied to adjust a reference metrology profile to provide a Virtual metrology of the process chamber. The virtual metrology is applied to control the performance of the process chamber.