The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2012

Filed:

Nov. 04, 2004
Applicants:

Hans J. Hug, Kirchdorf, CH;

Bart Hoogenboom, Basel, CH;

Sascha Martin, Basel, CH;

Jinling Yang, Beijing, CN;

Inventors:

Hans J. Hug, Kirchdorf, CH;

Bart Hoogenboom, Basel, CH;

Sascha Martin, Basel, CH;

Jinling Yang, Beijing, CN;

Assignee:

Nano World AG, Basel, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 5/28 (2006.01); G01B 21/30 (2006.01); G01Q 20/02 (2010.01); G01Q 40/02 (2010.01); G01Q 70/02 (2010.01); G01Q 90/00 (2010.01);
U.S. Cl.
CPC ...
Abstract

A cantilever assembly () comprises a cantilever () having a cantilever tip (). The cantilever is mounted to a rigid support () and is provided on its back side with an area () of a high reflectance material having a boundary () sloping towards the support (). The extensions (c, Δc) of the area () and of the boundary () towards the support fulfil the condition c/Δc≧1 wherein c denotes the extension of the area () of the high reflectance material in the direction towards the support (), and Δc denotes the extension of the sloped boundary () of the area () of the high reflectance material in the direction towards the support ().


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