The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Nov. 02, 2007
Yi Zheng, San Ramon, CA (US);
Yimin Hsu, Sunnyvale, CA (US);
Wen-chien David Hsiao, San Jose, CA (US);
Ming Jiang, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Sue Siyang Zhang, Saratoga, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Hung-chin Guthrie, Saratoga, CA (US);
Ning Shi, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Prabodh Ratnaparkhi, San Jose, CA (US);
Yinshi Liu, Foster City, CA (US);
Yi Zheng, San Ramon, CA (US);
Yimin Hsu, Sunnyvale, CA (US);
Wen-Chien David Hsiao, San Jose, CA (US);
Ming Jiang, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Sue Siyang Zhang, Saratoga, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Hung-Chin Guthrie, Saratoga, CA (US);
Ning Shi, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Prabodh Ratnaparkhi, San Jose, CA (US);
Yinshi Liu, Foster City, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.