The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Apr. 23, 2009
Rui Wang, Redmond, WA (US);
Qun Guo, Bellevue, WA (US);
Yixue Zhu, Sammamish, WA (US);
Michael E. Habben, Sammamish, WA (US);
Rui Wang, Redmond, WA (US);
Qun Guo, Bellevue, WA (US);
Yixue Zhu, Sammamish, WA (US);
Michael E. Habben, Sammamish, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
Aspects of the subject matter described herein relate to multi-log based replication. In aspects, database fragments are associated with different logs. Each change to a duplicated database record may be recorded in multiple logs. A history data structure is used to determine when duplication schemas are valid. A duplication schema indicates what database fragments duplicate one or more database records. For a particular time range, the duplication schema history is used to determine whether currently available logs include all changes. If multiple logs include the same change, one log may be selected to provide the change. Non-duplicative changes may be placed into a single data stream usable to update a remote database.