The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Oct. 06, 2006
Applicants:

Ion Bita, San Jose, CA (US);

Gang Xu, Cupertino, CA (US);

Mark Mienko, San Jose, CA (US);

Russell Wayne Gruhlke, Santa Clara, CA (US);

Inventors:

Ion Bita, San Jose, CA (US);

Gang Xu, Cupertino, CA (US);

Mark Mienko, San Jose, CA (US);

Russell Wayne Gruhlke, Santa Clara, CA (US);

Assignee:

Qualcomm MEMS Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G03B 21/00 (2006.01); F21V 7/07 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments include systems and methods for reducing visible artifacts such as Moiré, or interference, patterns, in displays. One embodiment includes a display device comprising a plurality of light modulators and a plurality of illumination elements configured to direct light to the light modulators. The directed light of the plurality of illumination elements collectively defines an nonuniformly varying pattern of light.


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