The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Feb. 16, 2007
Takashi Fukumoto, Niigata, JP;
Ichihiro Aratani, Niigata, JP;
Takashi Fukumoto, Niigata, JP;
Ichihiro Aratani, Niigata, JP;
Kuraray Co., Ltd., Kurashiki-shi, JP;
Abstract
(1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, Rand Rare taken together to form a ring together with a carbon atom to which Rand Rare bonded, and Rand Ras taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; Rrepresents a hydrogen atom or a methyl group; W represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.)