The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Mar. 13, 2008
Xiao Yang, Cupertino, CA (US);
Yuxiang Wang, Palo Alto, CA (US);
YE Wang, Cupertino, CA (US);
Justin Payne, San Jose, CA (US);
Wook Ji, San Jose, CA (US);
Xiao Yang, Cupertino, CA (US);
Yuxiang Wang, Palo Alto, CA (US);
Ye Wang, Cupertino, CA (US);
Justin Payne, San Jose, CA (US);
Wook Ji, San Jose, CA (US);
Miradia Inc., Santa Clara, CA (US);
Abstract
A method of performing overlay error correction includes forming a photoresist layer over a substrate and exposing a first set of apertures to incident radiation. The method also includes determining an overlay error associated with the first set of apertures and determining an overlay correction as a function of the determined overlay error. The method further includes exposing a data area and a second set of apertures. The data area and the second set of apertures are exposed based, in part, on the determined overlay correction. Moreover, the method includes verifying the determined overlay correction.