The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Mar. 12, 2010
Yukio Kawaguchi, Tokyo, JP;
Hiroshi Takasaki, Tokyo, JP;
Isamu Kuribayashi, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
The present invention aims at providing a sputtering target for making an optical medium whose reflective layer is mainly composed of Ag and capable of attaining an optical medium which is excellent in surface smoothness and can sufficiently suppress noise and jitter, a method of making the same, an optical medium, and a method of making the same. The present invention provides a sputtering target for making an optical medium comprising 0.1 to 2 at % of one or two elements selected from the group consisting of Ta and Nb, 0.1 to 1 at % of Al, and the balance constituted by Ag and unavoidable impurities; and an optical medium comprising a reflective layer having this composition on a substrate.