The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Sep. 08, 2009
Applicants:
Yukio Kawaguchi, Tokyo, JP;
Isamu Kuribayashi, Tokyo, JP;
Inventors:
Yukio Kawaguchi, Tokyo, JP;
Isamu Kuribayashi, Tokyo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. An optical mediumcomprises a substrateand reflective layersA,B provided on the substrate. Each of the reflective layersA,B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.