The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
May. 01, 2008
Andrew W Tudhope, Danville, CA (US);
William J Boardman, Danville, CA (US);
Steven F Sciamanna, Orinda, CA (US);
Thomas B Casserly, San Ramon, CA (US);
Robert M Carlson, Petaluma, CA (US);
Andrew W Tudhope, Danville, CA (US);
William J Boardman, Danville, CA (US);
Steven F Sciamanna, Orinda, CA (US);
Thomas B Casserly, San Ramon, CA (US);
Robert M Carlson, Petaluma, CA (US);
Other;
Abstract
A method of forming a diamond-like carbon coating by plasma enhanced chemical vapor deposition on an internal surface of a hollow component having an inner surface. A reduced atmospheric pressure is created within a pipe or other hollow component to be treated. A diamondoid precursor gas is introduced to the interior of the component. A bias voltage is established between a first electrode and one or more second electrodes. The first electrode is or is attached to the component. The second electrode is externally offset from an opening of the component, by a hollow insulator. A plasma region is established adjacent an inner surface of the component and extends through the hollow insulator. The precursor gas comprises at least one diamondoid. The pressure and bias voltage are selected such as to cause the deposition of diamond-like carbon on the inner surface.