The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Apr. 28, 2004
Applicants:

Hiroshi Miura, Fuji, JP;

Makoto Kanebako, Sunto-gun, JP;

Masayuki Kanishi, Numadu, JP;

Toshio Inagi, Mishima, JP;

Hirofumi Takeuchi, Gifu, JP;

Tsutomu Kajino, Toyoake, JP;

Yoshiaki Fukushima, Aichi-gun, JP;

Haruo Takahashi, Ohgaki, JP;

Inventors:

Hiroshi Miura, Fuji, JP;

Makoto Kanebako, Sunto-gun, JP;

Masayuki Kanishi, Numadu, JP;

Toshio Inagi, Mishima, JP;

Hirofumi Takeuchi, Gifu, JP;

Tsutomu Kajino, Toyoake, JP;

Yoshiaki Fukushima, Aichi-gun, JP;

Haruo Takahashi, Ohgaki, JP;

Assignees:

Kowa Co., Ltd., Nagoya-shi, JP;

Kabushiki Kaisha Toyota Chuo Kenkyusho, Aichi-gun, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 31/50 (2006.01); A61K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition containing an extremely poorly water-soluble drug and obtained by treating, with a supercritical fluid or subcritical fluid of carbon dioxide, a mixture comprising a porous silica material and the extremely poorly water-soluble drug; and its production process. The porous silica material has an average pore diameter in a range of from 1 to 20 nm, pores having diameters within ±40% of the average pore size account for at least 60% of a total pore volume of the porous silica material, and in X-ray diffractometry, the porous silica material has at least one peak at a position of diffraction angle (2θ) corresponding to a d value of at least 1 nm. The composition according to the present invention, which contains the extremely poorly water-soluble drug, is excellent in the dissolution of the extremely poorly water-soluble drug.


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