The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Jul. 07, 2010
Applicants:

Juanita Parris, Montvale, NJ (US);

Ning Wu, Pittstown, NJ (US);

Jeannette Simoni-truncellito, Ridgefield Park, NJ (US);

Robert Catena, Stockholm, NJ (US);

Jitu Modi, Hazlet, NJ (US);

William P. Keaveney, Pompton Plains, NJ (US);

Robert Auerbach, Paducah, KY (US);

Inventors:

Juanita Parris, Montvale, NJ (US);

Ning Wu, Pittstown, NJ (US);

Jeannette Simoni-Truncellito, Ridgefield Park, NJ (US);

Robert Catena, Stockholm, NJ (US);

Jitu Modi, Hazlet, NJ (US);

William P. Keaveney, Pompton Plains, NJ (US);

Robert Auerbach, Paducah, KY (US);

Assignee:

Sun Chemical Corporation, Fort Lee, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/00 (2006.01); C09D 11/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of preparing a universal base composition disclosed which consists of milling a pigment in a resin that is soluble in both water and organic solvent and wherein the resin contains both hydrophobic and hydrophilic monomers such that the total weight of the hydrophobic and hydrophilic monomers is at least about 20% of the total weight of the resin and the weight ratio of hydrophobic monomers to hydrophilic monomers is from about 1/5 to about 5.


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