The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Sep. 29, 2006
Applicants:

Ronald W. Laconto, Leicester, MA (US);

Andrew G. Haerle, Sutton, MA (US);

Inventors:

Ronald W. Laconto, Leicester, MA (US);

Andrew G. Haerle, Sutton, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2:1.


Find Patent Forward Citations

Laconto, Ronald. (2012). Polishing slurries (U.S. Patent No. 8105135). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8105135

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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