The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Jan. 05, 2009
Atsushi Yamaguchi, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
Shin Narushima, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Makoto Sato, Tokyo, JP;
Tatsuhiro Nojima, Tokyo, JP;
Atsushi Yamaguchi, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
Shin Narushima, Tokyo, JP;
Hiromichi Umehara, Tokyo, JP;
Makoto Sato, Tokyo, JP;
Tatsuhiro Nojima, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
In a perpendicular magnetic write head manufacturing method a magnetic layer is formed on a substrate. On the magnetic layer, first and second nonmagnetic layers are formed with different materials. A mask pattern is formed on the second nonmagnetic layer, and the second nonmagnetic layer in a region not covered with the mask pattern is removed. Thereby, the patterned second nonmagnetic layer is formed while leaving the first nonmagnetic layer. The mask pattern is removed and a milling process is selectively performed on the first nonmagnetic layer and the magnetic layer with the patterned second nonmagnetic layer as a mask to remove all of the first nonmagnetic layer in an exposed region and to dig down the magnetic layer in the exposed region, thereby forming a main magnetic pole layer having an inclined part whose thickness decreases with distance from an edge position of the patterned second nonmagnetic layer.