The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Mar. 12, 2008
Shuit-tong Lee, Hong Kong SAR, CN;
Wenjun Zhang, Hong Kong SAR, CN;
Igor Bello, Hong Kong SAR, CN;
You-sheng Zou, Jiangxi Province, CN;
Shuit-Tong Lee, Hong Kong SAR, CN;
Wenjun Zhang, Hong Kong SAR, CN;
Igor Bello, Hong Kong SAR, CN;
You-Sheng Zou, Jiangxi Province, CN;
City University of Hong Kong, Kowloon, HK;
Abstract
A method for fabricating diamond nanopillars includes forming a diamond film on a substrate, depositing a metal mask layer on the diamond film, and etching the diamond film coated with the metal mask layer to form diamond nanopillars below the mask layer. The method may also comprise forming diamond nuclei on the substrate prior to forming the diamond film. Typically, a semiconductor substrate, an insulating substrate, a metal substrate, or an alloy substrate is used.