The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Feb. 25, 2008
Applicant:
Andrew E. Carlson, Berkeley, CA (US);
Inventor:
Andrew E. Carlson, Berkeley, CA (US);
Assignee:
The Regents of the University of California, Oakland, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
Abstract
A spacer lithography process for creating negative features such as, for example, cut-lines, or trenches, and holes is provided. The negative spacer lithography process may be utilized along with positive spacer lithography to fabricate electronic devices or the like. In one embodiment, a process is provided for fabricating a 6-transistor Static Random-Access Memory (SRAM) cell or arrays of 6-transistor SRAM cells using only, or at least primarily, positive and negative spacer lithography.