The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Jan. 21, 2010
Pierre Fayet, Lausanne, CH;
Bertrand Jaccoud, Siviriez, CH;
Pierre Fayet, Lausanne, CH;
Bertrand Jaccoud, Siviriez, CH;
Tetral Laval Holdings & Finance S.A., Pully, CH;
Abstract
A device for carrying out a plasma enhanced process includes, within a vacuum chamber, at least one magnetron electrode () constituting an unbalanced magnetron having a flat magnetron face () with peripheral and central magnetic poles of opposite polarities connected to a source () of alternating voltage. The device further includes a device for positioning a substrate (), the substrate having a surface to be treated facing the magnetron face (), and a gas supply device for supplying a process gas or process gas mixture to the space between the magnetron face () and the treated surface. The distance between the magnetron face () and the treated surface is adapted to the magnetic field created by the magnetron electrode () such that there is a visible plasma band running between darker tunnels formed by magnetic field lines extending between peripheral and central magnetic poles of the magnetron face () and the treated surface, the plasma band having a minimum width but having homogeneous brightness towards the treated surface.