The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Aug. 29, 2008
Applicants:
Hongwei MA, Beijing, CN;
Long Fu, Beijing, CN;
Inventors:
Hongwei Ma, Beijing, CN;
Long Fu, Beijing, CN;
Assignee:
Peking University, Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N 43/713 (2006.01); C08G 77/04 (2006.01); C08G 77/12 (2006.01); C08G 77/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed herein is a surface functionalized poly(dimethylsiloxane) (PDMS) and methods for making the same. The surface functionalized PDMS disclosed herein is applicable in the general field of microfluidics, bioMEMS (bio-microelectromechanical systems), soft lithography, and other related biotechnology fields.
Quick Actions:
Ma, Hongwei. (2012). Light sensitive pdms for complex pattern formation (U.S. Patent No. 8097639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8097639
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